2-D Logic Device Scaling to Forksheet, and Technical Challenges to Nanosheet / Forksheet Configurations
David Xiao
IMEC
Symposium III: Dry & Wet Etch and Cleaning
Symposium III: Dry & Wet Etch and Cleaning
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Deep and Vertical Polyimide Etching
Yuwei Kong
NAURA
Innovative Future Etch Technology by Atomic-order control
Yoshihide Kihara
TEL
Practical Solutions to the Challenges of Quantitative Radical Species Sensoring in Process Plasmas
Jianping Zhao
TEL
Release Process Development for MEMS Micro-Bridge Structure
Bo Zhang
HHGrace
The latest development and results on CCP etch applications
Abin Shin
AMEC
Perspective on Plasma Etching in Advanced Packaging
Yuanwei Lin
NAURA
The Greenway of understanding Electronic Today's Cleaning's needs
Patrick Duchi
Inventec Performance Chemicals
Manufacturing Process Optimization of Polycrystaline Aluminum and Aluminum Alloy on SiO2/Si
Ping Linda Zhang
Richmond Star Hi-Tech Consulting Inc.
The Etching Morphology of Silver Study by Inductively Coupled Ar-Based Plasmas
Zhongwei Jiang
NAURA
New Frontiers of Device Fabrication with Atomic Precision
Peter Ventzek
TEL, US
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THE IMPROVEMENT OF AL-CU ALLOY CL-CORROSION RESISTANCE
zoushifeng
HHGrace
Study on Low Power Back-side Deep Trench Isolation Etching on Stack-BSI CMOS Image Sensor
Zhuo Yin
Peking University
Optimization of a Photoresist Trim Process with ICP Reactor
Tianyin Sun
Lam Research
Selective TiN vs W Etch for 3nm and Below Applications
Chien-Pin Sherman Hsu
Avantor
FinFET Gate Etch modeling by Coventor SEMulator3D®
Hexin Zhou
Lam Research
Pre-Silicidation Clean Product for 5nm and Beyond Contact
Biran Zhang
Applied Materials (China), Inc.
Gate-Cut Patterning Approaches Simulation and Defect Modelling by SEMulator3D®
Sun Li Fei, Wang Qing Peng, Zhang Ji Hong, Chi Yu Shan
Lam Research
HNA Wet Etching Optimization in Wafer Thinning of BSI Process
PengFei Lyu
Lam Research Service Co., Ltd
Improving Sidewall Roughness Performance through Shorten Phase Time RAP Process on Syndion tool in Deep Silicon Etching
Sun Yiling
Lam Research Corporation
MRAM MTJ Ion Beam Etching Simulation
Caigan Chen
Lam Research Service Co. Ltd.
FinFET Work Function Metal Recess Loading Improvement
Caigan Chen
Lam Research Service Co. Ltd.
Si3N4 plasma etching study for optimized morphology performance
Quanbao Li; Xiaohui Ren; Jihong Zhang; Yushan Chi
Lam Research Service Co., Ltd
Line Etch with HBr Cure Uniformity Study in Plasma Etch
Xiaohui Ren
Lam Research Service Co., Ltd
Silicon Wafer Cleaning Optimization With Ozonated DI Water
Jia Xu
Lam Research
Silicon Wafer Uniformity and Roughness Control by Etchants on Wafer Thinning
Pin Chang, Li
Lam Research
Study on characteristics of ion beam emitted from optical system of ion source
Yongjie Hu
Jiangsu Normal University
Etch Front Flatness Modification at Wafer Extreme Edge in a High Aspect Ratio Process
Junming Wang
Lam Research
High Aspect Ratio Silicon Etch with High Selectivity to Tungsten
Chun Gao
Lam Research
Peeling Defect Studying with N2/H2 Plasma during Carbon-based Recess Etch
Tao, Ye
Lam Research
Bias Pulsing Plasma Etching for Polysilicon Gate Profile Control
Yan He
NAURA
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