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Symposium I: Device Engineering and Memory Technology

Symposium I: Device Engineering and Memory Technology

Virtual Conference Registration
  • Conference Agenda
  • CSTIC 2023 Call for Papers

Opening Remarks

  • Oral Session

  • Poster Session

  • Bioinspired in-sensor computing for artificial vision

    Yang CHAI

    The Hong Kong Polytechnic University

    Architectures and Chips of "Sensing with Computing" for Intelligent Continuous Perception

    Fei Qiao

    Tsinghua University

    High Density Integrated Intrinsically Stretchable Electronics

    Yuqing Zheng

    Peking University

    2D NEMS and 2D Electronics for Energy-Efficient Sensing and Computing

    Rui Yang

    University of Michigan-Shanghai Jiao Tong University Joint Institute

    Memristor-based Reservoir Computing

    Zhongrui Wang

    University of Hong Kong

    In-Memory Computing for Machine Intelligence

    Bonan Yan

    Peking University

    Low Carbon Chips for Emerging Zeta-scale Computing

    Hao Yu

    Southern University of Science and Technology

    Hardware-Based Neural Networks Using Flash Memory Technologies

    Sungmin Hwang

    Korea University Sejong Campus

    Design of Ferroelectric FET-Based Capacitive-Coupling Computing-In-Memory for Binary Neural Networks

    Boyi Fu

    Peking University

    HFXZR1-XO2 FERROELECTRIC THIN FILM GRAIN SIZE TUNING VIA ANNEALING RAMP RATE ACHIEVING ENDURANCE >10^9 CYCLES, 2PR OF 40.6 µC/CM^2, WRITE VOLTAGE DOWN TO 1.5 V, AND SWITCHING SPEED OF 30 NS

    Jun Lan

    Southern University of Science and Technology

    Hybrid 2D/CMOS Microchips for Memristive Applications

    Mario Lanza

    King Abdullah University of Science and Technology (KAUST)

    High Performance Electronic Devices Based on Novel Materials for Logic and Memory Applications

    Yanqing Wu

    Peking University

    Ferroelectric Devices as Next Generation Low-Power Logic Technology: NCFETs

    Sihyun Kim

    Sogang University

    Functional circuits based on 2D semiconductors

    Wenzhong Bao

    Fudan University

    Large Area CVD MoS2 Memristor Suitable For Neuromorphic Applications

    Xuewei Feng

    The Study on Reducing Bit line Parasitic Capacitance in Advanced DRAM

    Yexiao Yu

    ChangXin Memory Technologies(CXMT)

    Low Temperature Ge CMOS for Future M3D Technology

    Heng Wu

    Peking University

    Technologies for Superior Reliability in SiC Power Devices

    Chi Min-hwa

    SiEn (Qindao) Integrated circuits Cor.

    Leakage Reduction of GAA Stacked Si Nanosheet CMOS Transistors and 6T-SRAM Cell via Spacer Bottom Footing Optimization

    Xuexiang Zhang

    Experimental Investigation of Ultra-low Temperature La2O3/HfO2 Bi-layer Dipole-first Process Using PVD Method for Advanced IC Technology

    Yanzhao Wei

    Institute of Microelectronics, Chinese Academy of Sciences

    A Compact Sawtooth Wave Generator Based on Novel Z²-Fet Device

    Hui Xie

    Fudan University

  • Fabrication and Characterization of a Novel Embedded Mirror Gate SONOS

    Ning Wang

    HHGrace

    High endurance SONOS technology improved by design &process optimization

    Pingsheng Zhou

    HHGrace

    Promoting Chip Probing Test Yield by Simple ISSG and Global Wet Process

    Jingsong Peng

    HHGrace

    An On-chip Superconducting Quantum Transponder

    Rutian Huang

    Tsinghua University

    Design and simulation of a superconducting switch based on weakly damped superconducting quantum interference devices

    Xinyu Wu

    Tsinghua University

    Study of Breakdown Voltage improvement of High-voltage PLDMOS

    Wenting Duan

    HuaHong Grace Semiconductor Manufacturing Corporation

    Study of the formation of Copper void defect and process optimization for reduction in dual damascene process

    Hongliang Zhu

    SMIC

    Study on N-Type MOSCAP Capacitor and Range in 55nm CMOS

    Hongliang Zhu

    SMIC

    INVESTIGATION OF A NEW DISTURB EFFECT IN THE AGGRESSIVELY SCALED DUAL-BIT/CELL SPLIT-GATE FLOATING-GATE FLASH CELL

    Zhaozhao Xu

    Huahong Semiconductor (Wuxi) Limited

    Important Process Parameter and Its Sensitivity Check by Virtual Fabrication: Channel Hole Profile Impact on Advanced 3D NAND Structure

    Wang Qingpeng

    Coventor Inc., A Lam Research Company

    FinFET Source/Drain Parasitic Resistance Optimization by TCAD Simulation

    Tongtong Luan

    ShanghaiTech University

    Simulation Study of Gate-All-Around Nanosheet Devices Based on SOI Structure

    Yangyang Hu

    Shanghai University

    Investigation of electrical characteristics on Morphotropic Phase Boundary of Hf1-xZrxO2 for Dynamic Random Access Memories

    Kun Zhong

    Institute of Microelectronics, Chinese Academy of Sciences

    Investigation of the doping profile for ion implants and rapid annealing in silicon via an improved method

    Zeqi Zha

    SMIC

    Novel Channel-On-Fin (COF)IGZO-TFTs with Ultra-Scaled Back Gate Length of 23 nm

    Shangbo Yang

    Institute of Microelectronics, Chinese Academy of Sciences

    Investigation of vertical channel IGZO-TFT based on PVD-IGZO

    Zhiyu Song

    Institute of Microelectronics, Chinese Academy of Sciences

    A Compact Model of Non-volatile Ferroelectric Tunnel FET with Ambipolarity for In-memory-computing

    Hanyong Shao

    Peking University

    Investigation of Synergic Hydrogen Mitigation Technique for Top-Gate a-IGZO Thin-Film Transistors

    Gangping Yan

    Beijing Superstring Academy of Memory Technology北京超弦存储器研究院

    Characterization of Field Cycling Fatigue in HfZrOx Ferroelectric Capacitors

    Puyang Cai

    Peking University

    Reliability Performance of Novel Tunneling Field Effect Transistors Based on Foundry Platform

    Yukun Tang

    Shanghai Jiaotong University

    Influence of Interfacial Layers and High-k Post Dielectric Annealing on the Characteristics of MOS Devices

    Guanqiao Sang

    Institute of Microelectronics, Chinese Academy of Sciences

    SILICIDE PROFILE OPTIMIZATION ON ACTIVE AREA IN 4XNM ETOX NOR FLASH MEMORY

    Yuxin Tong

    HHGrace

    Improvement of Standby current failure by device optimization on 4Xnm ETOX NOR-flash memory

    Zhuangzhuang Wang

    HHGrace

    Effects of floating gate profile on Cell Characteristics of 4Xnm FG-first ETOX NOR-flash memory

    Yihang Du

    HHGrace

    Improved Environmental Stability of N-type Polymer Field-Effect Transistors using Nickel Contact Electrodes

    Yuan Liu

    Nanjing University of Posts and Telecommunications

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